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Thereforepotentialsputteringmorelikelylowerelectronmobilitypioneers’workmostlyfocusedsemiconductors[9-12]newsputteringphenomenawerefoundcopper(Cu)HCI.Briefauthorintroduction:王铁山（1962），男，教授，研究方向：高电荷态离子与固体表面相互作用；低能核反应的研究；高放废物…
摘要：AsputteringtargetisprovidedthatincludesSiCandmetallicSiandhasanatomicratioofCtoSioffrom0.5to0.95andadensityoffrom2.75×103kg/m3to3.1×103kg/m3.Thesputteringtargetiscapableofformingathighspeedafilmthatcontains...
SputteringsystemswithmagneticallyenhancedionizationforionplatingofTiNfilms.ThereactivesputteringofhardcoatingsasTiNinlargedistancesand/oronlargesubstratesisdifficulttoperformwiththeconventionalmagnetron.Astrongmagneticconfinementofplasmabetweenthemagnetrontargetandsubstratesenhancesthegas...
论文查重优惠论文查重开题分析单篇购买文献互助用户中心UseofDCmagnetronsputteringsystems...EHLee，JKim展开摘要：Field-enhancedsputteringtargetsaredisclosedthatinclude:acorematerial;andasurfacematerial,whereinatleast...
Theeffectofsputteringpoweroncrystallinestructure,morphology,opticalandelectricalpropertiesoftheZTOfilmwassystematicallystudied.XRDresultsshowedthattheas-depositedZTOthinfilmshadahexagonalwurtzitestructure,with(002)orientation.
物理研究所_物理所公开发表论文_物理所公开发表论文_期刊论文推荐引用方式GB/T7714YI,HR,WANG,RI,Li,HC,etal.INSITUEPITAXIAL-GROWTHOFTHEGDBA2CU3O7SUPERCONDUCTINGTHIN-FILMSON(100)ZRO2BYMAGNETRONSPUTTERING
论文查重优惠论文查重开题分析单篇购买文献互助用户中心PowerSourceArrangementForMultiple-TargetSputteringSystem...Anarrangementforconcurrentlypoweringapluralityofsputteringsources.ApowersupplyiscoupledtoachargeTheduty...
Chapter64MRCSputteringSystemwithSputter-Etch：64章系统MRC..Chapter6.4MRCSputteringSystemSputter-Etch(mrc944)(584)1.0EquipmentPurpose1.1load-locked5kHzpulsed-DCsputtersystemsputteretchcapability.Fourdifferentmaterialsanygiventime.PLCcontrolledautomationsystemallowspallet-to-palletcontinuousoperation...
【Bookname】ThinFilmsMaterialTechnology:SputteringofCompoundMaterials【Publisher】Springer【Bookdescription】Aninvaluableresourceforindustrialscienceandengineeringnewcomerstosputterdepositiontechnologyinthinfilmproduction...
TheeffectofsputterpressureonthecrystallinityandmorphologyaswellasthephotodetectorperformanceofWO3filmsisstudied.Here,thethicknessoftheWO3filmsisdecreasedfrom225nmto95nmasthesputterpressureisincreasedfrom10mTorrto20mTorrduetothelowdepositionrateuponaccumulationofargonions.
Thereforepotentialsputteringmorelikelylowerelectronmobilitypioneers’workmostlyfocusedsemiconductors[9-12]newsputteringphenomenawerefoundcopper(Cu)HCI.Briefauthorintroduction:王铁山（1962），男，教授，研究方向：高电荷态离子与固体表面相互作用；低能核反应的研究；高放废物…
摘要：AsputteringtargetisprovidedthatincludesSiCandmetallicSiandhasanatomicratioofCtoSioffrom0.5to0.95andadensityoffrom2.75×103kg/m3to3.1×103kg/m3.Thesputteringtargetiscapableofformingathighspeedafilmthatcontains...
SputteringsystemswithmagneticallyenhancedionizationforionplatingofTiNfilms.ThereactivesputteringofhardcoatingsasTiNinlargedistancesand/oronlargesubstratesisdifficulttoperformwiththeconventionalmagnetron.Astrongmagneticconfinementofplasmabetweenthemagnetrontargetandsubstratesenhancesthegas...
论文查重优惠论文查重开题分析单篇购买文献互助用户中心UseofDCmagnetronsputteringsystems...EHLee，JKim展开摘要：Field-enhancedsputteringtargetsaredisclosedthatinclude:acorematerial;andasurfacematerial,whereinatleast...
Theeffectofsputteringpoweroncrystallinestructure,morphology,opticalandelectricalpropertiesoftheZTOfilmwassystematicallystudied.XRDresultsshowedthattheas-depositedZTOthinfilmshadahexagonalwurtzitestructure,with(002)orientation.
物理研究所_物理所公开发表论文_物理所公开发表论文_期刊论文推荐引用方式GB/T7714YI,HR,WANG,RI,Li,HC,etal.INSITUEPITAXIAL-GROWTHOFTHEGDBA2CU3O7SUPERCONDUCTINGTHIN-FILMSON(100)ZRO2BYMAGNETRONSPUTTERING
论文查重优惠论文查重开题分析单篇购买文献互助用户中心PowerSourceArrangementForMultiple-TargetSputteringSystem...Anarrangementforconcurrentlypoweringapluralityofsputteringsources.ApowersupplyiscoupledtoachargeTheduty...
Chapter64MRCSputteringSystemwithSputter-Etch：64章系统MRC..Chapter6.4MRCSputteringSystemSputter-Etch(mrc944)(584)1.0EquipmentPurpose1.1load-locked5kHzpulsed-DCsputtersystemsputteretchcapability.Fourdifferentmaterialsanygiventime.PLCcontrolledautomationsystemallowspallet-to-palletcontinuousoperation...
【Bookname】ThinFilmsMaterialTechnology:SputteringofCompoundMaterials【Publisher】Springer【Bookdescription】Aninvaluableresourceforindustrialscienceandengineeringnewcomerstosputterdepositiontechnologyinthinfilmproduction...
TheeffectofsputterpressureonthecrystallinityandmorphologyaswellasthephotodetectorperformanceofWO3filmsisstudied.Here,thethicknessoftheWO3filmsisdecreasedfrom225nmto95nmasthesputterpressureisincreasedfrom10mTorrto20mTorrduetothelowdepositionrateuponaccumulationofargonions.
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