城乡规划专业的毕业论文题目

城乡规划与资源环境管理专业围绕新农村建设好选题，围绕减排防污染也好选题。不能在网上下载。但必须去网上查素材。假如选“小城镇规划建设中的问题和建议”，就要了解全国这方面都有哪些问题，那些最突出、问题产生的原因，问题的焦点是什么，如何解决，在解决中要注意什么……素材愈多越好，决定选题时，题目不能太大，容易空，也不能太小，素材浪费。选一个不被别人注意的题最好，有发现，能的高分。

我也是资环的，最近也在写毕业论文，给你参考下：《城市规划与房地产开发协调发展浅析》《我国城市化进程中的问题与对策》《××市工业布局浅析》

go athena#line x loc=0.0 spac=0.1 line x loc=0.2 spac=0.006line x loc=0.4 spac=0.006line x loc=0.6 spac=0.01 #line y loc=0.0 spac=0.002 line y loc=0.2 spac=0.005line y loc=0.5 spac=0.05line y loc=0.8 spac=0.15 #init orientation=100 c.phos=1e14 space.mul=2#pwell formation including masking off of the nwell#diffus time=30 temp=1000 dryo2 press=1.00 hcl=3#etch oxide thick=0.02##P-well Implant# implant boron dose=8e12 energy=100 pears #diffus temp=950 time=100 weto2 hcl=3##N-well implant not shown -## welldrive starts herediffus time=50 temp=1000 t.rate=4.000 dryo2 press=0.10 hcl=3#diffus time=220 temp=1200 nitro press=1#diffus time=90 temp=1200 t.rate=-4.444 nitro press=1#etch oxide all##sacrificial "cleaning" oxidediffus time=20 temp=1000 dryo2 press=1 hcl=3#etch oxide all##gate oxide grown here:-diffus time=11 temp=925 dryo2 press=1.00 hcl=3## Extract a design parameter extract name="gateox" thickness oxide mat.occno=1 x.val=0.05##vt adjust implant implant boron dose=9.5e11 energy=10 pearson #depo poly thick=0.2 divi=10 ##from now on the situation is 2-D#etch poly left p1.x=0.35#method fermi compressdiffuse time=3 temp=900 weto2 press=1.0#implant phosphor dose=3.0e13 energy=20 pearson #depo oxide thick=0.120 divisions=8#etch oxide dry thick=0.120#implant arsenic dose=5.0e15 energy=50 pearson #method fermi compressdiffuse time=1 temp=900 nitro press=1.0## pattern s/d contact metaletch oxide left p1.x=0.2deposit alumin thick=0.03 divi=2etch alumin right p1.x=0.18# Extract design parameters# extract final S/D Xjextract name="nxj" xj silicon mat.occno=1 x.val=0.1 junc.occno=1# extract the N++ regions sheet resistanceextract name="n++ sheet rho" sheet.res material="Silicon" mat.occno=1 x.val=0.05 region.occno=1# extract the sheet rho under the spacer, of the LDD regionextract name="ldd sheet rho" sheet.res material="Silicon" \ mat.occno=1 x.val=0.3 region.occno=1# extract the surface conc under the channel.extract name="chan surf conc" surf.conc impurity="Net Doping" \ material="Silicon" mat.occno=1 x.val=0.45# extract a curve of conductance versus bias.extract start material="Polysilicon" mat.occno=1 \ bias=0.0 bias.step=0.2 bias.stop=2 x.val=0.45extract done name="sheet cond v bias" \ curve(bias,1dn.conduct material="Silicon" mat.occno=1 region.occno=1)\ outfile="extract.dat"# extract the long chan Vtextract name="n1dvt" 1dvt ntype vb=0.0 qss=1e10 x.val=0.49structure mirror rightelectrode name=gate x=0.5 y=0.1electrode name=source x=0.1electrode name=drain x=1.1electrode name=substrate backsidestructure outfile=mos1ex01_0.str# plot the structuretonyplot mos1ex01_0.str -set mos1ex01_0.set############# Vt Test : Returns Vt, Beta and Theta ################go atlas# set material modelsmodels cvt srh print contact name=gate n.polyinterface qf=3e10method newtonsolve init# Bias the drain solve vdrain=0.1 # Ramp the gatelog outf=mos1ex01_1.log mastersolve vgate=0 vstep=0.25 vfinal=3.0 name=gatesave outf=mos1ex01_1.str# plot resultstonyplot mos1ex01_1.log -set mos1ex01_1_log.set# extract device parametersextract name="nvt" (xintercept(maxslope(curve(abs(v."gate"),abs(i."drain")))) \ - abs(ave(v."drain"))/2.0)extract name="nbeta" slope(maxslope(curve(abs(v."gate"),abs(i."drain")))) \ * (1.0/abs(ave(v."drain")))extract name="ntheta" ((max(abs(v."drain")) * $"nbeta")/max(abs(i."drain"))) \ - (1.0 / (max(abs(v."gate")) - ($"nvt")))quit